Advancing Semiconductor Manufacturing with Ion Beam-Assisted Deposition
The semiconductor industry continually evolves, demanding innovative deposition techniques to enhance film quality, precision, and performance. One of the most advanced methods for thin film deposition is Ion Beam Technology, specifically Ion Beam-Assisted Deposition (IBAD). This technique plays a crucial role in improving the mechanical, optical, and electrical properties of thin films, making it a preferred choice in semiconductor manufacturing.